Foundry Plans to use Ultratech's LSA101 Dual Beam System to Ramp 28-nm Production. SAN JOSE, Calif., April 13, 2016 /PRNewswire/ -- Ultratech, Inc. (UTEK), a leading supplier of lithography, ...
LM7 Laser Melt Anneal System Targeted to Enable Contact Scaling and Improve Transistor Performance for 7-nm and Below Nodes. SAN JOSE, Calif., April 5, 2017 /PRNewswire/ -- Ultratech, Inc. (Nasdaq: ...
Fast anneal expected to impact a wide range of quantum computing applications, from advancing scientific research in quantum simulation and AI, to solving real-world problems across industries PALO ...
Cleveland-Cliffs Inc. (NYSE:CLF) is one of the best basic materials stocks to invest in. On June 20, Cleveland-Cliffs announced the commissioning of its new state-of-the-art Vertical Stainless Bright ...
Tool vendor Ultratech Inc. on Tuesday unveiled its next generation Unity platform, saying that all of its future generation tools would be built on the platform. The product of a four-year development ...
PALO ALTO, Calif – April 18, 2024 — Quantum computing company D-Wave Quantum Inc. (NYSE: QBTS) today launched the fast-anneal feature, available on all of D-Wave’s quantum processing units (QPUs) in ...
Ammunition manufacturers can avoid excessive inventory and part handling through the use of induction annealing systems, which, in turn, result in minimum wastage and improved yield at a low cost.
In the LSA101 system, a single CO2 laser beam is used to heat the wafer surface from a substrate temperature of approximately 400C to the peak annealing temperature in the range 1100-1350C. In the ...
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